Product Description
Vacuum Plasma Cleaning Machine Benchtop Plasma Cleaner
1.Industrial application
Semiconductor/Electronics : Clean chip, remove photoresist, improve bond strength.
Medical devices : Activated polymer materials (e.g. catheters, contact lenses) to enhance biocompatibility.
Automotive industry : dealing with the surface activation of rubber seals and headlights before bonding.
Packaging/printing : Improve the printing adhesion of plastic films.
Research : Surface modification of materials, fabrication of nanostructures.
Vacuum Plasma Cleaning Machine Benchtop Plasma Cleaner
2. Advantages
Environmental protection : No chemical solvent, reduce pollution.
Non-destructive : works only at nanoscale depth on the surface without damaging the substrate.
Efficient: Short processing times (seconds to minutes).
Versatile : works with a wide range of gases and materials (metals, plastics, ceramics, etc.)
Product Parameters
Model number |
HY-V4 |
Use of power |
220V |
power |
300W |
frequency |
40Khz IF /13.56Mhz RF (optional) |
Dimensions of equipment |
Length 630mm width 500mm height 480mm |
Size of load |
Length 220mm width 110mm height 90mm |
Size of cavity |
The diameter is 148mm and the depth is 266mm |
volume |
4L |
Mode of control |
PLC+ touch screen can be switched automatically and manually |
Gas channel |
2 way |
Gas available |
Oxygen, nitrogen, argon and other mixed gases |
Vacuum pump pumping speed |
6L/S |